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IMPORTANT SPUTTERING YIELD DATA FOR TOKAMAKS - A COMPARISON OF MEASUREMENTS AND ESTIMATES
被引:58
作者
:
BOHDANSKY, J
论文数:
0
引用数:
0
h-index:
0
BOHDANSKY, J
机构
:
来源
:
JOURNAL OF NUCLEAR MATERIALS
|
1980年
/ 93-4卷
/ OCT期
关键词
:
D O I
:
10.1016/0022-3115(80)90302-5
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:44 / 60
页数:17
相关论文
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SPUTTERING AND BACKSCATTERING OF keV LIGHT IONS BOMBARDING RANDOM TARGETS.
Weissmann, R.
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机构:
Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching,BRD-8046, Germany
Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching,BRD-8046, Germany
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机构:
H. C. ørsted Institute, Copenhagen,DK-2100, Denmark
Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching,BRD-8046, Germany
Sigmund, P.
[J].
Radiation Effects,
1973,
19
(01):
: 7
-
14
[92]
Winterbon K.B., 1975, ION IMPLANTATION RAN, V2
[93]
SURFACE MICROSTRUCTURAL EFFECTS ON ANGULAR-DISTRIBUTION OF MOLYBDENUM PARTICLES SPUTTERED WITH LOW-ENERGY NE+ IONS
YAMADA, R
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机构:
Japan Atomic Energy Research Institute, Naka-gun Ibaraki-ken, Tokai-mura
YAMADA, R
SONE, K
论文数:
0
引用数:
0
h-index:
0
机构:
Japan Atomic Energy Research Institute, Naka-gun Ibaraki-ken, Tokai-mura
SONE, K
SAIDOH, M
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Japan Atomic Energy Research Institute, Naka-gun Ibaraki-ken, Tokai-mura
SAIDOH, M
[J].
JOURNAL OF NUCLEAR MATERIALS,
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84
(1-2)
: 101
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108
[94]
YAMADA R, UNPUBLISHED
[95]
APPLICATION OF AES-SIMS (IMA)-FDS COMBINED SYSTEMS TO PHYSICAL AND CHEMICAL SPUTTERING PROCESSES OF GRAPHITE AND SILICON-CARBIDE SURFACES WITH ENERGETIC IONS
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YAMASHINA, T
MOHRI, M
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WATANABE, K
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HAYAKAWA, K
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[J].
JOURNAL OF NUCLEAR MATERIALS,
1978,
76-7
(1-2)
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203
[96]
REDUCTION OF ION SPUTTERING YIELD BY SPECIAL SURFACE MICROTOPOGRAPHY
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,YORKTOWN HTS,NY 10598
ZIEGLER, JF
CUOMO, JJ
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0
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IBM CORP,YORKTOWN HTS,NY 10598
ROTH, J
[J].
APPLIED PHYSICS LETTERS,
1977,
30
(06)
: 268
-
271
[97]
1979, WORKSHOP SPUTTERING
←
1
2
3
4
5
6
7
8
9
10
→
共 97 条
[91]
SPUTTERING AND BACKSCATTERING OF keV LIGHT IONS BOMBARDING RANDOM TARGETS.
Weissmann, R.
论文数:
0
引用数:
0
h-index:
0
机构:
Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching,BRD-8046, Germany
Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching,BRD-8046, Germany
Weissmann, R.
Sigmund, P.
论文数:
0
引用数:
0
h-index:
0
机构:
H. C. ørsted Institute, Copenhagen,DK-2100, Denmark
Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching,BRD-8046, Germany
Sigmund, P.
[J].
Radiation Effects,
1973,
19
(01):
: 7
-
14
[92]
Winterbon K.B., 1975, ION IMPLANTATION RAN, V2
[93]
SURFACE MICROSTRUCTURAL EFFECTS ON ANGULAR-DISTRIBUTION OF MOLYBDENUM PARTICLES SPUTTERED WITH LOW-ENERGY NE+ IONS
YAMADA, R
论文数:
0
引用数:
0
h-index:
0
机构:
Japan Atomic Energy Research Institute, Naka-gun Ibaraki-ken, Tokai-mura
YAMADA, R
SONE, K
论文数:
0
引用数:
0
h-index:
0
机构:
Japan Atomic Energy Research Institute, Naka-gun Ibaraki-ken, Tokai-mura
SONE, K
SAIDOH, M
论文数:
0
引用数:
0
h-index:
0
机构:
Japan Atomic Energy Research Institute, Naka-gun Ibaraki-ken, Tokai-mura
SAIDOH, M
[J].
JOURNAL OF NUCLEAR MATERIALS,
1979,
84
(1-2)
: 101
-
108
[94]
YAMADA R, UNPUBLISHED
[95]
APPLICATION OF AES-SIMS (IMA)-FDS COMBINED SYSTEMS TO PHYSICAL AND CHEMICAL SPUTTERING PROCESSES OF GRAPHITE AND SILICON-CARBIDE SURFACES WITH ENERGETIC IONS
YAMASHINA, T
论文数:
0
引用数:
0
h-index:
0
YAMASHINA, T
MOHRI, M
论文数:
0
引用数:
0
h-index:
0
MOHRI, M
WATANABE, K
论文数:
0
引用数:
0
h-index:
0
WATANABE, K
DOI, H
论文数:
0
引用数:
0
h-index:
0
DOI, H
HAYAKAWA, K
论文数:
0
引用数:
0
h-index:
0
HAYAKAWA, K
[J].
JOURNAL OF NUCLEAR MATERIALS,
1978,
76-7
(1-2)
: 202
-
203
[96]
REDUCTION OF ION SPUTTERING YIELD BY SPECIAL SURFACE MICROTOPOGRAPHY
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,YORKTOWN HTS,NY 10598
ZIEGLER, JF
CUOMO, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,YORKTOWN HTS,NY 10598
CUOMO, JJ
ROTH, J
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,YORKTOWN HTS,NY 10598
ROTH, J
[J].
APPLIED PHYSICS LETTERS,
1977,
30
(06)
: 268
-
271
[97]
1979, WORKSHOP SPUTTERING
←
1
2
3
4
5
6
7
8
9
10
→