THE ROLE OF LOW-ENERGY ION-BOMBARDMENT DURING THE GROWTH OF EPITAXIAL TIN(100) FILMS BY REACTIVE MAGNETRON SPUTTERING - DEFECT FORMATION AND ANNIHILATION

被引:7
作者
HULTMAN, L
HELMERSSON, U
BARNETT, SA
SUNDGREN, JE
GREENE, JE
机构
[1] UNIV ILLINOIS,DEPT MAT SCI,COORDINATED SCI LAB,URBANA,IL 61801
[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词
D O I
10.1116/1.574946
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2162 / 2164
页数:3
相关论文
共 13 条