DEEP LEVELS IN MOCVD GAAS GROWN UNDER DIFFERENT GA-AS MOL FRACTIONS

被引:41
作者
ZHU, HZ
ADACHI, Y
IKOMA, T
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关键词
D O I
10.1016/0022-0248(81)90283-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:154 / 163
页数:10
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共 14 条
[11]  
OKU M, 1981, 28TH JOINT M SOC APP, P483
[12]   DEEP LEVELS IN GALLIUM-ARSENIDE BY CAPACITANCE METHODS [J].
SAKAI, K ;
IKOMA, T .
APPLIED PHYSICS, 1974, 5 (02) :165-171
[13]   PHOTO-EXCITED DLTS - MEASUREMENT OF MINORITY-CARRIER TRAPS [J].
TAKIKAWA, M ;
IKOMA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (07) :L436-L438
[14]   DEEP ELECTRON TRAPS IN ORGANOMETALLIC VAPOR-PHASE GROWN ALXGA1-XAS [J].
WAGNER, EE ;
MARS, DE ;
HOM, G ;
STRINGFELLOW, GB .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) :5434-5437