ELLIPSOMETRIC CHARACTERIZATION OF HYDROGEN-RICH OXYNITRIDE FILMS

被引:5
作者
BORGHESI, A
SASSELLA, A
ROJAS, S
机构
[1] UNIV PAVIA,DIPARTIMENTO FIS A VOLTA,I-27100 PAVIA,ITALY
[2] SGS THOMSON MICROELECTR,I-20041 AGRATE B,ITALY
关键词
D O I
10.1016/0040-6090(93)90096-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Spectroscopic ellipsometry measurements on different plasma-enhanced chemical vapour deposited oxynitrides are reported in the 0.23-0.90 mum range. Results of direct calculation and of best-fit procedures based on the Sellmeier model and on the Bruggeman effective medium approximation used to obtain optical functions of the samples are compared.
引用
收藏
页码:227 / 230
页数:4
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