ANNEALING BEHAVIOR OF STRESS IN SB-IMPLANTED SI

被引：4

作者：

ITOH, N

NAKAU, T

MORIKAWA, Y

NAGAMI, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷 / 06期

关键词：

D O I：

10.1143/JJAP.17.1003

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1003 / 1008

页数：6

共 23 条

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JAPANESE JOURNAL OF APPLIED PHYSICS, 1975, 14 (12) :2069-2070

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