CHARACTERIZATION OF REFRACTORY W, WNX, AND WSIX FILMS ON GAAS USING THERMOREFLECTANCE MEASUREMENTS

被引：4

作者：

UCHITOMI, N

NAGAOKA, M

TOYODA, N

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 04期

关键词：

D O I：

10.1063/1.342948

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1743 / 1746

页数：4

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