FOCUSED ION-BEAM SYSTEM WITH A 4 STAGE EXB MASS FILTER

被引：4

作者：

KAWANAMI, Y

ISHITANI, T

UMEMURA, K

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷

关键词：

D O I：

10.1016/0168-583X(89)90177-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：240 / 243

页数：4

共 15 条

[1]

BAN E, 1982, 6TH P ISIAT KYOT

[2]

CLEAVER JRA, 1983, MICROCIRCUIT ENG 83, P135

[3] LIQUID-METAL ALLOY ION SOURCES FOR B, SB, AND SI [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

OCHIAI, Y ;

NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1182-1185

[4] B, AS AND SI FIELD-ION SOURCES [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

KA, KK ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :L595-L598

[5] CHARACTERIZATION OF PHOSPHORUS LIQUID-METAL ION-SOURCE AS A DOPANT SOURCE IN FOCUSED ION-BEAM SYSTEMS [J].

HIGUCHIRUSLI, RH ;

CORELLI, JC .

JOURNAL OF APPLIED PHYSICS, 1988, 63 (03) :603-610

[6] DEVELOPMENT OF PHOSPHORUS LIQUID-METAL-ION SOURCE [J].

ISHITANI, T ;

UMEMURA, K ;

TAMURA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05) :L330-L332

[7] MASS-SEPARATED MICROBEAM SYSTEM WITH A LIQUID-METAL-ION SOURCE [J].

ISHITANI, T ;

UMEMURA, K ;

TAMURA, H .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3) :363-367

[8]

ISHITANI T, 1982, JPN J APPL PHYS, V23, pL277

[9] CONTRIBUTION OF THE ION-ENERGY DISTRIBUTION TO THE CURRENT-DENSITY DISTRIBUTION OF A FOCUSED-ION BEAM [J].

KAWANAMI, Y ;

ISHITANI, T ;

UMEMURA, K ;

SHUKURI, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (05) :1364-1367

[10]

LIEBL H, 1978, C SERIES I PHYSICS, V38, P266

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