ABSOLUTE RATE CONSTANTS FOR THE REACTION OF SILYL WITH NITRIC-OXIDE, ETHYLENE, PROPYNE, AND PROPYLENE, AND THE SILYL RECOMBINATION REACTION

被引:32
作者
LOH, SK
BEACH, DB
JASINSKI, JM
机构
[1] IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY 10598
关键词
D O I
10.1016/0009-2614(90)85164-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The kinetics of the reactions SiH3 + SiH3 and SiH3 + NO, SiH3 + C3H6, C3H4, and C2H4 are examined with time-resolved IR diode laser spectroscopy. The use of SiH3Br as a precursor for direct photochemical production of SiH3 at 193 nm is demonstrated. SiH3 is observed to react with NO (k(NO) = (2.5 ± 0.5) × 10-12 cm3 molecule-1 s-1), C3H6 and C3H4 (k(C3H6) = (2.4 ± 0.3) × 10-13 and k(C3H4) ≤ (1.8 ± 0.4) × 10-14 cm3 molecule-1 s-1) but is unreactive toward C2H4 (k(C2H4) ≤ (3 ± 3) × 10-15 cm3 molecule-1 s-1). An upper limit to the bimolecular rate constant for the radical recombination process, SiH3 + SiH3, is determined, krc ≤ (6.1 ± 3.5) × 10-11 cm3 molecule-1 s-1. © 1990.
引用
收藏
页码:55 / 63
页数:9
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