THE INFLUENCE OF OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC REACTIVE MAGNETRON-SPUTTERED TITANIUM-OXIDE FILMS

被引：40

作者：

MENG, LJ

DOSSANTOS, MP

机构：

[1] Physics Department, University of Minho

来源：

APPLIED SURFACE SCIENCE | 1993年 / 68卷 / 03期

关键词：

D O I：

10.1016/0169-4332(93)90251-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Titanium oxide thin films were grown on glass substrates by DC reactive magnetron sputtering at various oxygen partial pressures. The films were characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and optical transmittance spectra. The effects of the oxygen partial pressure on the structural and optical properties of titanium oxide films were investigated.

引用

页码：319 / 325

页数：7

共 16 条

[1]

ALMEIDA JB, 1987, NUCL INSTRUM METH B, V18, P651

[2]

[Anonymous], 1967, JOINT COMMITTEE POWD

[3] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J].