HOLLOW-CATHODE DISCHARGE DEPOSITION OF TITANIUM WITH SUBSTRATE BIAS

被引：1

作者：

YOON, HJ ^{[1
]}

CARTER, WB ^{[1
]}

MORIYAMA, K ^{[1
]}

机构：

[1] IHT CORP,FREMONT,CA 94538

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.575587

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2344 / 2347

页数：4

共 25 条

[1] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J].

BLAND, RD ;

KOMINIAK, GJ ;

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :671-674

[2] INFLUENCE OF ION-BOMBARDMENT ON MICROSTRUCTURE OF THICK DEPOSITS PRODUCED BY HIGH RATE PHYSICAL VAPOR-DEPOSITION PROCESSES [J].

BUNSHAH, RF ;

JUNTZ, RS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1404-&

[3]

BUNSHAH RF, 1982, DEPOSITION TECHNOLOG, P7

[4]

CHALMERS B, 1954, T AM I MIN MET ENG, V200, P519

[5] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J].

DIRKS, AG ;

LEAMY, HJ .

THIN SOLID FILMS, 1977, 47 (03) :219-233

[6] CRYSTAL GROWTH AND ORIENTATION IN DEPOSITS CONDENSED FROM THE VAPOUR [J].

EVANS, DM ;

WILMAN, H .

ACTA CRYSTALLOGRAPHICA, 1952, 5 (06) :731-+

[7]

Gjostein N. A., 1973, DIFFUSION, P241

[8]

HARPER JME, 1984, ION BOMBARDMENT MODI, P127

[9] THE EFFECT OF OXYGEN ON THE GRAIN-BOUNDARY AND VOID STRUCTURE OF TITANIUM FILMS [J].

HIBBS, MK ;

SUNDGREN, JE ;

HENTZELL, HTG .

THIN SOLID FILMS, 1984, 116 (1-3) :177-189

[10] THERMAL INPUT TO SUBSTRATE DURING DEPOSITION BY HOLLOW-CATHODE DISCHARGE [J].

KOMIYA, S ;

TSURUOKA, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :589-592

← 1 2 3 →