ACCOUNTING FOR TIME-DEPENDENT EFFECTS ON CMOS TOTAL-DOSE RESPONSE IN-SPACE ENVIRONMENTS

被引:21
作者
FLEETWOOD, DM [1 ]
WINOKUR, PS [1 ]
BARNES, CE [1 ]
SHAW, DC [1 ]
机构
[1] JET PROP LAB, PASADENA, CA 91109 USA
关键词
D O I
10.1016/0969-806X(94)90206-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Time-dependent charge buildup and annealing processes cause the ionizing radiation response of CMOS devices and circuits to depend strongly on the dose rate of the exposure. Oxide-trap charge annealing and interface-trap buildup in nMOS transistors can lead to positive threshold voltage shifts in a space environment, while negative threshold voltage shifts are commonly observed after irradiations at typical laboratory dose rates [50-300 rad(Si)/s]. Thus, devices that pass laboratory testing can fail at the low dose rates encountered in space due to positive nMOS transistor threshold-voltage shifts above preirradiation values, i.e. ''rebound''. We summarize how this issue can be addressed in total-dose hardness assurance test methods for space. An example of such a guideline is the revised U.S. military-standard ionizing-radiation-effects test method (MIL-STD 883D, Test Method 1019.4).
引用
收藏
页码:129 / 138
页数:10
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