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EFFECTS OF LOW-ENERGY ION-BOMBARDMENT ON RF SPUTTERED MOS2-X FILMS

被引：7
作者：
GRIBI, P
SUN, ZW
LEVY, F
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1989年 / 22卷 / 01期
关键词：
D O I：
10.1088/0022-3727/22/1/037
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：238 / 240
页数：3
相关论文
共 4 条
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[2]   STOICHIOMETRY AND FRICTION PROPERTIES OF SPUTTERED MOSX LAYERS [J].
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THIN SOLID FILMS, 1985, 129 (1-2) :79-91
[3]   ENHANCED ENDURANCE LIFE OF SPUTTERED MOSX FILMS ON STEEL BY ION-BEAM MIXING [J].
KOBS, K ;
DIMIGEN, H ;
HUBSCH, H ;
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LEUTENECKER, R ;
RYSSEL, H .
MATERIALS SCIENCE AND ENGINEERING, 1987, 90 :281-286
[4]   FRICTION AND WEAR MEASUREMENTS OF SPUTTERED MOSX FILMS AMORPHIZED BY ION-BOMBARDMENT [J].
MIKKELSEN, NJ ;
CHEVALLIER, J ;
SORENSEN, G ;
STRAEDE, CA .
APPLIED PHYSICS LETTERS, 1988, 52 (14) :1130-1132
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