HYDROGEN EVOLUTION FROM PLASMA-DEPOSITED AMORPHOUS SILICON FILMS

被引:21
作者
MATYSIK, KJ
MOGAB, CJ
BAGLEY, BG
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期
关键词
D O I
10.1116/1.569575
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:302 / 304
页数:3
相关论文
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