A DOPING-PRECIPITATED MORPHOLOGY IN PLASMA-DEPOSITED A-SI-H

被引：41

作者：

SCHIFF, EA ^{[1
]}

PERSANS, PD ^{[1
]}

FRITZSCHE, H ^{[1
]}

AKOPYAN, V ^{[1
]}

机构：

[1] UNIV CHICAGO,JAMES FRANCK INST,CHICAGO,IL 60637

来源：

APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 02期

关键词：

D O I：

10.1063/1.92267

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：92 / 94

页数：3

共 12 条

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