NOVEL PLASMA DEVELOPABLE RESIST COMPOSITIONS AND PERFORMANCE OF TOTAL DRY MICROFABRICATIONS IN SUB-MICRON LITHOGRAPHY

被引：20

作者：

TSUDA, M ^{[1
]}

OIKAWA, S ^{[1
]}

KANAI, W ^{[1
]}

HASHIMOTO, K ^{[1
]}

YOKOTA, A ^{[1
]}

NUINO, K ^{[1
]}

HIJIKATA, I ^{[1
]}

UEHARA, A ^{[1
]}

NAKANE, H ^{[1
]}

机构：

[1] TOKYO OHKA KOGYO CO LTD,SAMUKAWA,KANAGAWA 25301,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571209

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1351 / 1357

页数：7

相关论文

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