METALORGANIC VAPOR-PHASE EPITAXIAL-GROWTH OF RED AND INFRARED VERTICAL-CAVITY SURFACE-EMITTING LASER-DIODES

被引:8
作者
HIBBSBRENNER, MK
SCHNEIDER, RP
MORGAN, RA
WALTERSON, RA
LEHMAN, JA
KALWEIT, EL
LOTT, JA
LEAR, KL
CHOQUETTE, KD
JUERGENSEN, H
机构
[1] SANDIA NATL LABS, ALBUQUERQUE, NM 87185 USA
[2] AIXTRON SEMICOND TECHNOL GMBH, AACHEN, GERMANY
关键词
D O I
10.1016/0026-2692(94)90138-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Metalorganic vapour phase epitaxy (MOVPE) is used For the growth of vertical-cavity surface-emitting laser (VCSEL) diodes. MOVPE exhibits a number of important advantages over the more commonly used molecular beam epitaxial (MBE) techniques, including ease of continuous compositional and dopant grading for low-resistance p-type distributed Bragg reflectors (DBRs), higher growth rates for rapid throughput and greater versatility in choice of materials, especially with phosphorus, and dopants. Top-emitting InGaAs/AlGaAs/AlAs 950 nm VCSELs exhibit the highest power conversion (wallplug) efficiencies (21%), lowest threshold voltage (1.47 V), and highest single mode power (4.4 mW from an 8 mu m device) yet reported. GaAs/AlGaAs/AlAs VCSELs lasing near 850 nm have demonstrated record low threshold voltage (1.7 V) at this wavelength, and excellent uniformity in wavelength (+/- 1%) across a 3-inch wafer, and in threshold voltage (+/- 1.5%), threshold current (+/- 10%) and output power (+/- 20%) across a 34-element array. 650 nm VCSELs based on AlGaInP/AlGaAs heterostructures have been demonstrated by MOVPE only, and lase continuous wave at room temperature, with voltage thresholds between 2.5 and 3 V and maximum power outputs of over 0.3 mW. These results establish MOVPE as a proven growth technique for this important new family of photonic devices.
引用
收藏
页码:747 / 755
页数:9
相关论文
共 26 条
[1]   DRIFT LEAKAGE CURRENT IN ALGAINP QUANTUM-WELL LASERS [J].
BOUR, DP ;
TREAT, DW ;
THORNTON, RL ;
GEELS, RS ;
WELCH, DF .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1993, 29 (05) :1337-1343
[2]  
BOUR DP, 1993, QUANTUM WELL LASERS, pCH9
[3]   LOW RESISTANCE WAVELENGTH-REPRODUCIBLE P-TYPE (AL,GA)AS DISTRIBUTED BRAGG REFLECTORS GROWN BY MOLECULAR-BEAM EPITAXY [J].
CHALMERS, SA ;
LEAR, KL ;
KILLEEN, KP .
APPLIED PHYSICS LETTERS, 1993, 62 (14) :1585-1587
[4]   PERFORMANCE OF GAIN-GUIDED SURFACE EMITTING LASERS WITH SEMICONDUCTOR DISTRIBUTED BRAGG REFLECTORS [J].
HASNAIN, G ;
TAI, K ;
YANG, L ;
WANG, YH ;
FISCHER, RJ ;
WYNN, JD ;
WEIR, B ;
DUTTA, NK ;
CHO, AY .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1991, 27 (06) :1377-1385
[5]   VERTICAL-CAVITY SURFACE-EMITTING LASERS - DESIGN, GROWTH, FABRICATION, CHARACTERIZATION [J].
JEWELL, JL ;
HARBISON, JP ;
SCHERER, A ;
LEE, YH ;
FLOREZ, LT .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1991, 27 (06) :1332-1346
[6]   THE DIFFUSION OF CL INTO CDTE [J].
JONES, ED ;
MALZBENDER, J ;
MULLIN, JB ;
SHAW, N .
JOURNAL OF PHYSICS-CONDENSED MATTER, 1994, 6 (37) :7499-7504
[7]   LOW-THRESHOLD CURRENT LOW-VOLTAGE VERTICAL-CAVITY SURFACE-EMITTING LASERS WITH LOW-AL-CONTENT P-TYPE MIRRORS GROWN BY MOCVD [J].
KAWAKAMI, T ;
KADOTA, Y ;
KOHAMA, Y ;
TADOKORO, T .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1992, 4 (12) :1325-1327
[8]   REDUCTION OF P-DOPED MIRROR ELECTRICAL-RESISTANCE OF GAAS/ALGAAS VERTICAL-CAVITY SURFACE-EMITTING LASERS BY DELTA-DOPING [J].
KOJIMA, K ;
MORGAN, RA ;
MULLALY, T ;
GUTH, GD ;
FOCHT, MW ;
LEIBENGUTH, RE ;
ASOM, MT .
ELECTRONICS LETTERS, 1993, 29 (20) :1771-1772
[9]   N-TYPE AND P-TYPE DOPANT PROFILES IN DISTRIBUTED BRAGG REFLECTOR STRUCTURES AND THEIR EFFECT ON RESISTANCE [J].
KOPF, RF ;
SCHUBERT, EF ;
DOWNEY, SW ;
EMERSON, AB .
APPLIED PHYSICS LETTERS, 1992, 61 (15) :1820-1822
[10]   HETEROJUNCTION BAND OFFSETS AND EFFECTIVE MASSES IN III-V QUATERNARY ALLOYS [J].
KRIJN, MPCM .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1991, 6 (01) :27-31