OMVPE GROWTH OF GAINAS/INP AND GAINAS/GAINASP QUANTUM-WELLS

被引:75
作者
KAMEI, H
HAYASHI, H
机构
[1] Opto-electronics R and D Laboratories, Sumitomo Electric Industries, Ltd., Sakae-ku, Yokohama, 244, 1, Taya-cho
关键词
D O I
10.1016/0022-0248(91)90522-7
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
GaInAs/InP quantum wells (QWs) were grown by OMVPE. It was experimentally demonstrated that the substitutions from P to As atoms on InP surfaces in AsH3 flows and from P to As atoms on GaInAs surfaces in PH3 flows took place during growth interruption intervals at heterointerfaces. The substitutions between As and P atoms were limited to an atomic plane on the surface in an appropriate range of intervals. The substitution from P to As atoms was completed within a 0.5 s AsH3 flow interval, and that from As to P atoms within a 5 s PH3 flow interval at a substrate temperature of 600-degrees-C. Atomic arrangements at the heterointerfaces of high quality GaInAs/InP QWs were revealed. High quality GaInAs/GaInAsP (lambda = 1.3 mu-m) QWs were also grown using the optimal growth conditions for GaInAs/InP QWs.
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页码:567 / 572
页数:6
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