SPUTTERING YIELD CALCULATION FOR BINARY TARGET

被引:4
作者
JIMENEZRODRIGUEZ, JJ
RODRIGUEZVIDAL, M
VALLESABARCA, JA
机构
[1] Dept. Electr. Electron., Fac. C.C. Fis., Univ. Complutense, Madrid, Spain
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1979年 / 41卷 / 03期
关键词
D O I
10.1080/00337577908236961
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
The generalization for binary targets, of the ideas proposed by Sigmund for monoatomic targets, leads to a set of coupled integrodifferential equations for the sputtering functions. After moment decompostion, the final formulae are obtained by the standard method, based on the Laplace Transform, where the inverse transform is made with the aid of asymptotic expansions in the limit of very high projectile energy as compared to the surface binding energy. The possible loss of stoichiometry for binary targets is analyzed. Comparison of computed values of sputtering yield for normal incidence, with experimental results shows good agreement.
引用
收藏
页码:165 / 173
页数:9
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