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PARALLEL BETWEEN SURFACE STATES AT SI-SIO2 INTERFACE AND B2 CENTER IN IRRADIATED SIO2
被引:14
作者
:
HICKMOTT, TW
论文数:
0
引用数:
0
h-index:
0
HICKMOTT, TW
机构
:
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1972年
/ 9卷
/ 01期
关键词
:
D O I
:
10.1116/1.1316592
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:311 / +
页数:1
相关论文
共 43 条
[21]
PRODUCTION AND ANNEALING OF COLOR CENTERS IN RF SPUTTERED SIO2 FILMS
HICKMOTT, TW
论文数:
0
引用数:
0
h-index:
0
HICKMOTT, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1971,
42
(06)
: 2543
-
&
[22]
RADIATION DAMAGE IN RADIO-FREQUENCY-SPUTTERED SIO2 FILMS
HICKMOTT, TW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Laboratory, Hopewell Junction
HICKMOTT, TW
[J].
APPLIED PHYSICS LETTERS,
1969,
15
(07)
: 232
-
&
[23]
EFFECTS OF HEAT TREATMENT ON THERMALLY OXIDIZED SILICON
ICHINOHE, E
论文数:
0
引用数:
0
h-index:
0
ICHINOHE, E
KUBO, S
论文数:
0
引用数:
0
h-index:
0
KUBO, S
AKIYAMA, K
论文数:
0
引用数:
0
h-index:
0
AKIYAMA, K
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1966,
5
(05)
: 454
-
&
[24]
KERR DR, 1969, P INT C PROPERTIES U, P303
[25]
KOOI E, 1966, PHILIPS RES REP, V21, P477
[26]
KOOI E, 1965, PHILIPS RES REP, V20, P595
[27]
NONEQUILIBRIUM EFFECTS IN QUASI-STATIC MOS MEASUREMENTS
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
NICOLLIAN, EH
论文数:
0
引用数:
0
h-index:
0
NICOLLIAN, EH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(02)
: 370
-
+
[28]
A QUASI-STATIC TECHNIQUE FOR MOS C-V AND SURFACE STATE MEASUREMENTS
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
[J].
SOLID-STATE ELECTRONICS,
1970,
13
(06)
: 873
-
+
[29]
LEHMAN H, 1964, IBM J RES DEV, V8, P922
[30]
Lell E, 1966, PROGR CERAMIC SCI, V4, P3
←
1
2
3
4
5
→
共 43 条
[21]
PRODUCTION AND ANNEALING OF COLOR CENTERS IN RF SPUTTERED SIO2 FILMS
HICKMOTT, TW
论文数:
0
引用数:
0
h-index:
0
HICKMOTT, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1971,
42
(06)
: 2543
-
&
[22]
RADIATION DAMAGE IN RADIO-FREQUENCY-SPUTTERED SIO2 FILMS
HICKMOTT, TW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Laboratory, Hopewell Junction
HICKMOTT, TW
[J].
APPLIED PHYSICS LETTERS,
1969,
15
(07)
: 232
-
&
[23]
EFFECTS OF HEAT TREATMENT ON THERMALLY OXIDIZED SILICON
ICHINOHE, E
论文数:
0
引用数:
0
h-index:
0
ICHINOHE, E
KUBO, S
论文数:
0
引用数:
0
h-index:
0
KUBO, S
AKIYAMA, K
论文数:
0
引用数:
0
h-index:
0
AKIYAMA, K
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1966,
5
(05)
: 454
-
&
[24]
KERR DR, 1969, P INT C PROPERTIES U, P303
[25]
KOOI E, 1966, PHILIPS RES REP, V21, P477
[26]
KOOI E, 1965, PHILIPS RES REP, V20, P595
[27]
NONEQUILIBRIUM EFFECTS IN QUASI-STATIC MOS MEASUREMENTS
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
NICOLLIAN, EH
论文数:
0
引用数:
0
h-index:
0
NICOLLIAN, EH
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(02)
: 370
-
+
[28]
A QUASI-STATIC TECHNIQUE FOR MOS C-V AND SURFACE STATE MEASUREMENTS
KUHN, M
论文数:
0
引用数:
0
h-index:
0
KUHN, M
[J].
SOLID-STATE ELECTRONICS,
1970,
13
(06)
: 873
-
+
[29]
LEHMAN H, 1964, IBM J RES DEV, V8, P922
[30]
Lell E, 1966, PROGR CERAMIC SCI, V4, P3
←
1
2
3
4
5
→