PLASMA-ASSISTED ETCHING OF ALUMINUM IN CCL4-CL2 MIXTURES

被引：6

作者：

DAGOSTINO, R

CAPEZZUTO, P

CRAMAROSSA, F

FRACASSI, F

机构：

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1989年 / 9卷 / 04期

关键词：

D O I：

10.1007/BF01023917

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：513 / 525

页数：13

共 24 条

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