INDIVIDUAL, ATTRACTIVE DEFECT CENTERS IN THE SIO2-SI INTERFACE OF MU-M-SIZED MOSFETS

In a micron-sized p-channel MOSFET, the alternate capture and emission of holes into a Coulomb-attractive defect center is analyzed by the random telegraph signal in the source-drain current. Anomalous switching is observed with a high channel conductance when the defect center is occupied, and a low channel conductance after re-emission. The rate constants show an inverse symmetry for capture and emission. The measured results are interpreted by a tunneling transfer of a hole bound in the channel at the attractive center to the defect center 2.4 nm deep in the oxide and vice versa. The energy offset of the two stable configurations can be lineraly varied by the gate voltage. An excited state 40 meV above the ground state is observed for the defect level. The anomalous switching is caused by a mobility change rather than by a change in mobile charge carrier density. The tunneling transfer for Coulomb-attractive centers differs from the transfer observed for Coulomb-repulsive centers where activated emission is reported.