ROOM-TEMPERATURE OPERATION OF GAINAS/GAINASP/INP SCH LASERS WITH QUANTUM-WIRE SIZE ACTIVE-REGION

被引:27
作者
MIYAKE, Y [1 ]
HIRAYAMA, H [1 ]
KUDO, K [1 ]
TAMURA, S [1 ]
ARAI, S [1 ]
ASADA, M [1 ]
MIYAMOTO, Y [1 ]
SUEMATSU, Y [1 ]
机构
[1] TOKYO INST TECHNOL,DEPT ELECT & ELECTR ENGN,TOKYO 152,JAPAN
关键词
D O I
10.1109/3.234478
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Improvements in the fabrication process of GaInAs(P)/InP devices consisting of an ultrafine structure by using two-step organometallic vapor phase epitaxy growth, electron beam exposure direct writing, and wet chemical etching are reported. This improved process enabled us to achieve, for the first time, a room-temperature continuous-wave operation of GaInAs/InP quantum-wire lasers consisting of 5-nm-thick and 10-30 nm-wide vertically stacked triple quantum-wire active region within the period of 70 nm. A large blue shift of approximately 40 nm was observed in both the lasing and the electroluminescence spectra of Ga0.3In0.7As/InP compressively strained multi-quantum-well wirelasers consisting of a 3 nm-thick and 30-60 nm-wide five-wire active region, which suggests a reduced effective mass of holes along the in-plane direction.
引用
收藏
页码:2123 / 2133
页数:11
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