THE EFFECT OF BIAS ON DC AND RF SPUTTERED WC-CO COATINGS

被引：23

作者：

ESER, E

OGILVIE, RE

TAYLOR, KA

机构：

[1] MIT,CAMBRIDGE,MA 02139

[2] HIGH VACUUM CORP,HINGHAM,MA 02043

来源：

THIN SOLID FILMS | 1980年 / 67卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90459-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：265 / 277

页数：13

共 16 条

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[3] SPUTTER GAS-PRESSURE AND DC SUBSTRATE BIAS EFFECTS ON THICK RF-DIODE SPUTTERED FILMS OF TI OXYCARBIDES [J].

CARSON, WW .

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[4]

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[5]

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[6]

CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453

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[8] STRUCTURAL AND COMPOSITIONAL CHARACTERIZATION OF SPUTTER-DEPOSITED WC+CO FILMS [J].

ESER, E ;

OGILVIE, RE ;

TAYLOR, KA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :396-400

[9] MEASUREMENT OF PLASMA DISCHARGE CHARACTERISTICS FOR SPUTTERING APPLICATIONS [J].

ESER, E ;

OGILVIE, RE ;

TAYLOR, KA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :199-202

[10] FRICTION AND WEAR RESULTS FROM WC+CO COATINGS BY -DC-BIASED RF SPUTTERING IN A HELIUM ATMOSPHERE [J].

ESER, E ;

OGILVIE, RE ;

TAYLOR, KA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :401-405

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