TARGET AND SUBSTRATE SURFACE-REACTION KINETICS IN MAGNETRON SPUTTERING OF NITRIDE COATINGS

被引：61

作者：

HOFMANN, S

机构：

[1] Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, D-7000 Stuttgart 1

来源：

THIN SOLID FILMS | 1990年 / 191卷 / 02期

关键词：

D O I：

10.1016/0040-6090(90)90384-P

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Simple model description of both the target and the substrate reactions are applied to explain experimental results on the deposition rate and coating composition as a function of the nitrogen partial pressure for ZrNx, NbNx and MoNx coatings fabricated by reactive magnetron sputtering in an ArN2 atmosphere. Calculations of the influence of oxygen as a model residual gas on the composition of the coating are compared with experimental data as a function of the oxygen pressure for TiNx. The results show that the simplified models give a consistent quantitative description with reasonable semi-empirical fitting parameters for the sputtering rates and reaction coefficients at the target and the substrate. © 1990.

引用

页码：335 / 348

页数：14

共 27 条

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