MICROSTRUCTURE OF ZIRCONIA FILMS PREPARED BY ARGON ION-BEAM ENHANCED DEPOSITION

The microstructure of zirconia films prepared by argon ion beam enhanced deposition is examined with RBS, TEM, XRD, and XPS. The results show that the films consist of three layers: the first layer of about 8 nm exists on the uppermost surface of the sample, which was contaminated by carbon, the second layer is the bulk of the film which is approximately stoichiometric under certain conditions, and the third layer is a transition layer of about 15 to 20 nm between zirconia and substrate. Partial crystallization of the films happens in our experimental conditions and phase identification is also made.