CHARGING EFFECT OF ION-IMPLANTATION ON GLASS

被引:2
作者
OYOSHI, K
TAGAMI, T
TANAKA, S
机构
[1] Tsukuba Research Laboratory, Nippon Sheet Glass Co Ltd., Tsukuba, Ibaraki, 300-26
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 11A期
关键词
ION BEAM; ION IMPLANTATION; GLASS; INSULATOR; CHARGING; SURFACE; DEPTH PROFILE; CHARGE NEUTRALIZATION;
D O I
10.1143/JJAP.32.5170
中图分类号
O59 [应用物理学];
学科分类号
摘要
Methods to suppress charge build-up during ion implantation in glass and the charging effect of ion implantation on glass have been investigated- The methods to suppress charge build-up, such as use of an electron flood gun or metal film coating, and electron generation from ion-irradiated metal, are effective and sufficient in the present experiment. Positive charge accumulates on the glass surface without these charge neutralization methods. A decrease in the projected range of implanted ions and in actual ion dose, and inhomogeneous planar distribution due to the charging have become evident. Strong visible light emission and broadening of the light-emitted area due to the charging are also observed during the ion implantation.
引用
收藏
页码:5170 / 5175
页数:6
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