INSITU STUDIES OF FAST ATOM BOMBARDMENT AND ANNEALING PROCESSES BY REFLECTION ELECTRON-MICROSCOPY

被引：10

作者：

OGAWA, S

TANISHIRO, Y

YAGI, K

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1988年 / 33卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(88)90610-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：474 / 478

页数：5

共 10 条

[1]

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[2]

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NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 13 (1-3) :319-323

[4] AN ION-SPUTTERING GUN TO CLEAN CRYSTAL-SURFACES INSITU IN AN ULTRAHIGH-VACUUM ELECTRON-MICROSCOPE [J].

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YAGI, K ;

HONJO, G .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :1981-1994

[5]

OGAWA S, 1986, 11TH P INT C EL MICR, V2, P1349

[6] REFLECTION ELECTRON-MICROSCOPY OF CLEAN AND GOLD DEPOSITED (111) SILICON SURFACES [J].

OSAKABE, N ;

TANISHIRO, Y ;

YAGI, K ;

HONJO, G .

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[7] DEVELOPMENT OF SURFACE-TOPOGRAPHY DURING DEPTH PROFILING IN AUGER-ELECTRON SPECTROSCOPY [J].

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[8] CONTROLLED SPUTTERING OF METALS BY LOW-ENERGY HG IONS [J].

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[9]

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[10] REFLECTION ELECTRON-MICROSCOPY [J].

YAGI, K .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1987, 20 (03) :147-160

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