PLASMA-ETCHING CHARACTERISTICS OF CHROMIUM FILM AND ITS NOVEL ETCHING MODE

被引:46
作者
NAKATA, H
NISHIOKA, K
ABE, H
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 06期
关键词
D O I
10.1116/1.570669
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1351 / 1357
页数:7
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