EPITAXIAL ORIENTATION AND MORPHOLOGY OF THIN COSI2 FILMS GROWN ON SI(100) - EFFECTS OF GROWTH-PARAMETERS

被引：55

作者：

YALISOVE, SM

TUNG, RT

LORETTO, D

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576079

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1472 / 1474

页数：3

共 12 条

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