DIFFUSION-BARRIERS AT MERCURY CADMIUM TELLURIDE METAL INTERFACES - THE CASE OF HG1-XCDX TE(110)/YB/AL

被引：16

作者：

RAISANEN, A ^{[1
]}

WALL, A ^{[1
]}

CHANG, S ^{[1
]}

PHILIP, P ^{[1
]}

TROULLIER, N ^{[1
]}

FRANCIOSI, A ^{[1
]}

PETERMAN, DJ ^{[1
]}

机构：

[1] MCDONNELL DOUGLAS CORP,RES LABS,ST LOUIS,MO 63166

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.575498

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2741 / 2745

页数：5

共 25 条

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[9] INTERACTIONS BETWEEN CLEAVED (HG, CD)TE SURFACES AND DEPOSITED OVERLAYERS OF AL AND INDIUM
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[10] OVERLAYER INTERACTIONS WITH (HGCD)TE
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