INTERFACIAL REACTIONS BETWEEN (HGCD)TE AND INTERMEDIATE REACTIVITY OVERLAYERS

被引:9
作者
DAVIS, GD [1 ]
BECK, WA [1 ]
KELLY, MK [1 ]
KILDAY, DG [1 ]
MO, YW [1 ]
MARGARITONDO, G [1 ]
机构
[1] UNIV WISCONSIN,MADISON,WI 53706
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期
关键词
D O I
10.1116/1.575496
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2732 / 2735
页数:4
相关论文
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