CRYSTALLINE-STRUCTURE CHANGES OF MOLYBDENUM SILICIDE FILMS DEPOSITED BY SPUTTERING AND BY CO-EVAPORATION AFTER ISOCHRONAL ANNEALING

被引:14
作者
SHIBATA, K
SHIMA, S
KASHIWAGI, M
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D O I
10.1149/1.2124199
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1527 / 1531
页数:5
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