CHANGE OF THE ELECTRON EFFECTIVE MASS IN EXTREMELY HEAVILY DOPED NORMAL-TYPE SI OBTAINED BY ION-IMPLANTATION AND LASER ANNEALING

被引：53

作者：

MIYAO, M

MOTOOKA, T

NATSUAKI, N

TOKUYAMA, T

机构：

来源：

SOLID STATE COMMUNICATIONS | 1981年 / 37卷 / 07期

关键词：

D O I：

10.1016/0038-1098(81)90144-7

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

收藏

页码：605 / 608

页数：4

相关论文

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