Engineered heterostructures of 6.1 angstrom III-V semiconductors for advanced electronic and optoelectronic applications

被引:14
作者
Shanabrook, BV [1 ]
Barvosa-Carter, W [1 ]
Bass, R [1 ]
Bennett, BR [1 ]
Boos, JB [1 ]
Bewley, WW [1 ]
Bracker, AS [1 ]
Culbertson, JC [1 ]
Glaser, ER [1 ]
Kruppa, W [1 ]
Magno, R [1 ]
Moore, WJ [1 ]
Meyer, JR [1 ]
Nosho, BZ [1 ]
Park, D [1 ]
Thibado, PM [1 ]
Twigg, ME [1 ]
Wagner, RJ [1 ]
Waterman, JR [1 ]
Whitman, LJ [1 ]
Yang, MJ [1 ]
机构
[1] USN, Res Lab, Washington, DC 20375 USA
来源
ENGINEERED NANOSTRUCTURAL FILMS AND MATERIALS | 1999年 / 3790卷
关键词
high-speed electronics; IR lasers; IR detectors; band structure engineering; epitaxy; InAs; GaSb; AlSb;
D O I
10.1117/12.351249
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Heterostructures formed from III-V semiconductors with the 6.1 Angstrom lattice spacing (InAs, GaSb, AlSb and related alloys) have attracted significant interest because of their potential to define a new 'state of the art' in applications including 100 GHz high-speed logic circuits, terahertz transistors, sensitive infrared detectors and mid-infrared semiconductor lasers. In this paper, we describe the ongoing work at the Naval Research Laboratory to develop the materials growth and fabrication technology for a variety of 6.1 A-based devices which have the potential to revolutionize infrared optoelectronics and low-power, high-speed electronics.
引用
收藏
页码:13 / 22
页数:10
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