X-RAY ANALYSIS OF TANTALUM FILMS TRIODE-SPUTTERED IN ARGON-OXYGEN MIXTURES

被引：19

作者：

WESTWOOD, WD ^{[1
]}

机构：

[1] BELL TEL CO INC,NO RES,OTTAWA,ONTARIO,CANADA

来源：

THIN SOLID FILMS | 1973年 / 15卷 / 01期

关键词：

D O I：

10.1016/0040-6090(73)90200-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：15 / 30

页数：16

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共 22 条

[1] PHASES OBSERVED IN OXYGEN-REACTIVE SPUTTERING OF TANTALUM
FEINSTEIN, LG
[J]. APPLIED PHYSICS LETTERS, 1971, 19 (05) : 137 - +
[2] STRUCTURE AND ELECTRICAL PROPERTIES OF TA FILMS SPUTTERED IN AR-O2
FEINSTEIN, LG
GERSTENBERG, D
[J]. THIN SOLID FILMS, 1972, 10 (01) : 79 - +
[3] GEBHARDT E, 1958, PLANSEE P REUTTE, P280
[4] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
GERSTENBERG, D
CALBICK, CJ
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) : 402 - &
[5] PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM
GERSTENBERG, D
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) : 542 - +
[6] INGREY SJ, UNPUBLISHED
[7] DEPOSITION OF TANTALUM TANTALUM OXIDE AND TANTALUM NITRIDE WITH CONTROLLED ELECTRICAL CHARACTERISTICS
KRIKORIAN, E
SNEED, RJ
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) : 3674 - +
[8] METALLIC OXIDE PHASES OF NIOBIUM AND TANTALUM .1. X-RAY INVESTIGATIONS
NORMAN, N
[J]. JOURNAL OF THE LESS-COMMON METALS, 1962, 4 (01): : 52 - 61
[9] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E)
READ, MH
ALTMAN, C
[J]. APPLIED PHYSICS LETTERS, 1965, 7 (03) : 51 - &
[10] X-RAY ANALYSIS OF SPUTTERED FILMS OF BETA-TANTALUM AND BODY-CENTERED CUBIC TANTALUM
READ, MH
HENSLER, DH
[J]. THIN SOLID FILMS, 1972, 10 (01) : 123 - &