KINETICS OF PLASMA ANODIZATION OF ALUMINUM

被引：7

作者：

PROPP, M ^{[1
]}

YOUNG, L ^{[1
]}

PULFREY, DL ^{[1
]}

OLIVE, G ^{[1
]}

机构：

[1] UNIV BRITISH COLUMBIA,DEPT ELECT ENGN,VANCOUVER V6T 1W5,BRITISH COLUMBI,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 06期

关键词：

D O I：

10.1149/1.2133447

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：891 / 897

页数：7

相关论文

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[8] SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES
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[9] SPUTTERING OF OXIDE FILMS IN PLASMA ANODIZATION OF ALUMINUM
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