DIAMOND MEMBRANE BASED X-RAY MASKS

被引:4
作者
LOCHEL, B [1 ]
HUBER, HL [1 ]
KLAGES, CP [1 ]
SCHAFER, L [1 ]
BLUHM, A [1 ]
机构
[1] FRAUNHOFER INST SCHICHT & OBERFLACHENTECHN,W-2000 HAMBURG 54,GERMANY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期
关键词
D O I
10.1116/1.585916
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Diamond layers are of special interest for x-ray mask fabrication because of their excellent optical and mechanical properties. Using a plasma activated chemical vapor deposition process, 2-5 mum thick diamond layers were deposited and characterized. Microhardness and Young's modulus are found to be very close to the literature values of bulk diamond. A standard isotropic etching process was applied for membrane fabrication. The optical transparency and the thickness homogeneity were measured. Concerning surface roughness, scanning electron micrographs and atomic force measurements were evaluated. After irradiation of diamond masks with synchrotron light, a slight increase of optical transparency was found.
引用
收藏
页码:3217 / 3220
页数:4
相关论文
共 11 条
[1]   SILICON MEMBRANE MASK BLANKS FOR X-RAY AND ION PROJECTION LITHOGRAPHY [J].
LOCHEL, B ;
CHLEBEK, J ;
GRIMM, J ;
HUBER, HL ;
MACIOSSEK, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (11) :2605-2609
[2]   DIAMOND MEMBRANES FOR X-RAY MASKS [J].
LOCHEL, B ;
SCHLIWINSKI, HJ ;
HUBER, HL ;
TRUBE, J ;
SCHAFER, L ;
KLAGES, CP ;
LUTHJE, H .
MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) :175-179
[3]  
MALDONADO JR, 1989, UNPUB SEP S EL DEF S
[4]  
OERTEL KH, 1991, P SPIE, V1465, P244
[5]   GROWTH AND PROPERTIES OF DIAMOND FILMS PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION USING DIFFERENT OXYGEN-CONTAINING SOURCE GASES [J].
SCHAFER, L ;
KLAGES, CP .
SURFACE & COATINGS TECHNOLOGY, 1991, 47 (1-3) :13-21
[6]  
SCHAFER L, 1991, APPL DIAMOND FILMS R, P121
[7]   X-RAY-IRRADIATION EFFECTS ON A MICROWAVE-PLASMA CHEMICAL VAPOR-DEPOSITION DIAMOND MEMBRANE [J].
SUZUKI, K ;
KUMAR, R ;
WINDISCHMANN, H ;
SANO, H ;
IIMURA, Y ;
MIYASHITA, H ;
WATANABE, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3266-3269
[8]  
WEISS M, 1991, MICROELECTRON ENG, V17, P402
[9]   RADIATION STABILITY OF SIC AND DIAMOND MEMBRANES AS POTENTIAL X-RAY-LITHOGRAPHY MASK CARRIERS [J].
WELLS, GM ;
PALMER, S ;
CERRINA, F ;
PURDES, A ;
GNADE, B .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06) :1575-1578
[10]   CRITICAL DIMENSION CONTROL IN X-RAY MASKS WITH ELECTROPLATED GOLD ABSORBERS. [J].
Windbracke, W. ;
Betz, H. ;
Huber, H.-L. ;
Pilz, W. ;
Pongratz, S. .
Microelectronic Engineering, 1986, 5 (1-4) :73-80