COMPETITIVE REACTIONS OF FLUORINE AND OXYGEN WITH W, WSI2, AND SI SURFACES IN REACTIVE ION ETCHING USING CF4/O2

被引：25

作者：

OEHRLEIN, GS

LINDSTOM, JL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576225

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1035 / 1041

页数：7

共 25 条

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[9] CHOW TP, 1984, DRY ETCHING MICROELE, P39
[10] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES
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