THERMAL REDISTRIBUTION OF OXYGEN DURING SOLID-PHASE REGROWTH OF ARSENIC-IMPLANTED AMORPHIZED SI

被引:19
作者
MAGEE, TJ
LEUNG, C
KAWAYOSHI, H
ORMOND, R
FURMAN, BK
EVANS, CA
DAY, DS
机构
[1] CHARLES EVANS & ASSOCIATES,SAN MATEO,CA 94402
[2] AVANTEK INC,SANTA CLARA,CA 95051
关键词
D O I
10.1063/1.92756
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:413 / 415
页数:3
相关论文
共 8 条
[1]   LASER IRRADIATION OF FURNACE PREANNEALED (111) ION-IMPLANTED SILICON [J].
CAMPISANO, SU ;
FOTI, G .
APPLIED PHYSICS LETTERS, 1980, 36 (04) :279-281
[2]   REDISTRIBUTION OF IMPLANTED OXYGEN AND CARBON IN SILICON [J].
KOYAMA, H .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3202-3205
[3]   GETTERING OF MOBILE OXYGEN AND DEFECT STABILITY WITHIN BACK-SURFACE DAMAGE REGIONS IN SI [J].
MAGEE, TJ ;
LEUNG, C ;
KAWAYOSHI, H .
APPLIED PHYSICS LETTERS, 1981, 38 (11) :891-893
[4]  
MAGEE TJ, 1981, APPL PHYS LETT, V39
[5]  
MAGEE TJ, 1981, J APPL PHYS, V52
[6]  
MAGEE TJ, 1980, ONR N00014800071 CON
[7]   ELECTRON-MICROSCOPY STUDY OF DEFECT STRUCTURES IN RECRYSTALLIZED AMORPHOUS LAYERS OF SELF-ION-IRRADIATED (111) SILICON [J].
RECHTIN, MD ;
PRONKO, PP ;
FOTI, G ;
CSEPREGI, L ;
KENNEDY, EF ;
MAYER, JW .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1978, 37 (05) :605-620
[8]  
1977, ANN BOOK ASTM STA 43, pF121