DEPOSITION OF NITRIDES AND OXIDES OF ALUMINUM AND TITANIUM BY PULSE LASER IRRADIATION

被引：12

作者：

NISHITANI, SR

YOSHIMURA, S

KAWATA, H

YAMAGUCHI, M

机构：

[1] Department of Metal Science and Technology, Kyoto University

来源：

JOURNAL OF MATERIALS RESEARCH | 1992年 / 7卷 / 03期

关键词：

D O I：

10.1557/JMR.1992.0725

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Deposits of nitrides and oxides of Al and Ti have been produced by laser irradiation of Al and Ti targets in air, N2, and NH3 + N2 gases. Microstructure and constituent phases in these deposits have been examined by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and x-ray diffractometry (XRD). The distribution of metalloid.elements has been investigated by Rutherford backscattering spectrometry (RBS). On the basis of the results of these examinations, the nitride and oxide deposits have been shown to be formed by reactions between ambient gas and metal-melt or metal-vapor which take place during pulse laser irradiation,

引用

页码：725 / 733

页数：9

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