LASER ABLATION DEPOSITION OF TITANIUM NITRIDE FILMS ON SILICON SUBSTRATES AT ROOM-TEMPERATURE

被引：12

作者：

AUCIELLO, O

BARNES, T

CHEVACHAROENKUL, S

SCHREINER, AF

MCGUIRE, GE

机构：

[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695

[2] N CAROLINA STATE UNIV,DEPT CHEM,RALEIGH,NC 27695

来源：

THIN SOLID FILMS | 1989年 / 181卷

关键词：

D O I：

10.1016/0040-6090(89)90473-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：65 / 73

页数：9

共 21 条

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