AMORPHOUS SIOX-H ALLOY-FILMS AS WIDE OPTICAL-GAP MATERIALS

被引：8

作者：

HAGA, K ^{[1
]}

MIURA, H ^{[1
]}

KUMANO, M ^{[1
]}

WATANABE, H ^{[1
]}

机构：

[1] SENDAI NATL COLL TECHNOL,SENDAI 98931,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1989年 / 115卷 / 1-3期

关键词：

D O I：

10.1016/0022-3093(89)90382-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：126 / 128

页数：3

共 7 条

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ANDERSON, DA ;

SPEAR, WE .

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[2] WIDE OPTICAL-GAP A-SI-O-H FILMS PREPARED FROM SIH4-CO2 GAS-MIXTURE [J].

HAGA, K ;

YAMAMOTO, K ;

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WATANABE, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (01) :L39-L41

[3]

KIM WY, 1985, 17TH C SOL STAT DEV

[4] WIDE OPTICAL-GAP, PHOTOCONDUCTIVE A-SIXN1-X-H [J].

KURATA, H ;

HIROSE, M ;

OSAKA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (11) :L811-L813

[5] STRUCTURE AND DEFECTS IN AMORPHOUS SI-O FILMS [J].

MORIMOTO, A ;

NORIYAMA, H ;

SHIMIZU, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (01) :22-27

[6] A-SI1-XOX-H FILMS PREPARED BY DIRECT PHOTO-CVD USING CO2 GAS [J].

OTSUBO, S ;

SAITO, M ;

MORIMOTO, A ;

KUMEDA, M ;

SHIMIZU, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (11) :L1999-L2002

[7]

Xu Wenyuan, 1982, Chinese Journal of Semiconductors, V3, P197

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