RF SPUTTERING OF ALXIN1-XN THIN-FILMS

被引：25

作者：

STAROSTA, K

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1981年 / 68卷 / 01期

关键词：

D O I：

10.1002/pssa.2210680154

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：K55 / K57

页数：3

共 10 条

[1] GROWTH AND PROPERTIES OF ALXGA1-XN EPITAXIAL LAYERS
BARANOV, B
DAWERITZ, L
GUTAN, VB
JUNGK, G
NEUMANN, H
RAIDT, H
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1978, 49 (02): : 629 - 636
[2] GROWTH OF IN1-XGAXSB AND IN1-XALXSB FILMS BY MULTI-TARGET RF SPUTTERING
GREENE, JE
WICKERSHAM, CE
ZILKO, JL
[J]. THIN SOLID FILMS, 1976, 32 (01) : 51 - 54
[3] GROWTH AND PROPERTIES OF GAXAL1-XN COMPOUNDS
HAGEN, J
METCALFE, RD
WICKENDEN, D
CLARK, W
[J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1978, 11 (04): : L143 - L146
[4] ELECTRICAL AND OPTICAL PROPERTIES OF RF-SPUTTERED GAN AND INN
HOVEL, HJ
CUOMO, JJ
[J]. APPLIED PHYSICS LETTERS, 1972, 20 (02) : 71 - &
[5] STRUCTURAL, OPTICAL, AND DIELECTRIC PROPERTIES OF REACTIVELY SPUTTERED FILMS IN SYSTEM AIN-BN
NOREIKA, AJ
FRANCOMBE, MH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04): : 722 - +
[6] DIELECTRIC PROPERTIES OF REACTIVELY SPUTTERED FILMS OF ALUMINUM NITRIDE
NOREIKA, AJ
FRANCOMBE, MH
ZEITMAN, SA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 194 - +
[7] PREPARATION AND OPTICAL-PROPERTIES OF GA1-XINXN THIN-FILMS
OSAMURA, K
NAKA, S
MURAKAMI, Y
[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) : 3432 - 3437
[8] SYNTHESIS OF 3-5 SEMICONDUCTOR NITRIDES BY REACTIVE CATHODIC SPUTTERING
PUYCHEVRIER, N
MENORET, M
[J]. THIN SOLID FILMS, 1976, 36 (01) : 141 - 145
[9] RF SPUTTERING OF GALLIUM-PHOSPHIDE THIN-FILMS
STAROSTA, K
ZELINKA, J
BERKOVA, D
KOHOUT, J
[J]. THIN SOLID FILMS, 1979, 61 (02) : 241 - 248
[10] STAROSTA K, 1980, THESIS TU PRAGUE

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