MICRODEFECTS IN SILICON AND THEIR RELATION TO POINT-DEFECTS

被引:30
作者
FOLL, H
GOSELE, U
KOLBESEN, BO
机构
[1] MAX PLANCK INST MET RES,INST PHYS,D-7000 STUTTGART 1,FED REP GER
[2] SIEMENS AG,GRUNDLAGENENTWICKLUNG HALBLEITERMAT,D-8000 MUNICH 80,FED REP GER
关键词
D O I
10.1016/0022-0248(81)90397-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:907 / 916
页数:10
相关论文
共 37 条
[31]   EFFECT OF RECONSTRUCTION DURING EPITAXIAL-GROWTH [J].
VANVECHTEN, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (04) :992-998
[32]   EFFECT OF RECONSTRUCTION OF A SEMICONDUCTOR SURFACE ON CRYSTAL-GROWTH [J].
VANVECHTEN, JA .
APPLIED PHYSICS LETTERS, 1975, 26 (11) :593-596
[33]   SIMPLE BALLISTIC MODEL FOR VACANCY MIGRATION [J].
VANVECHTEN, JA .
PHYSICAL REVIEW B, 1975, 12 (04) :1247-1251
[34]   FORMATION OF INTERSTITIAL-TYPE DISLOCATION LOOPS IN TETRAHEDRAL SEMICONDUCTORS BY PRECIPITATION OF VACANCIES [J].
VANVECHTEN, JA .
PHYSICAL REVIEW B, 1978, 17 (08) :3197-3206
[35]   POINT DEFECT TRAPPING IN CRYSTAL GROWTH [J].
WEBB, WW .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (06) :1961-&
[36]   OBSERVATION OF SMALL DEFECTS IN SILICON CRYSTAL BY DIFFUSE-X-RAY SCATTERING [J].
YASUAMI, S ;
HARADA, J ;
WAKAMATSU, K .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (11) :6860-6864
[37]  
[No title captured]