STRUCTURAL INVESTIGATION OF REACTIVELY SPUTTERED BORON-NITRIDE FILMS

被引：13

作者：

RICKERBY, DG

GIBSON, PN

GISSLER, W

HAUPT, J

机构：

[1] Institute for Advanced Materials, Commission of the European Communities Joint Research Centre, 21020 Ispra, Varese

来源：

THIN SOLID FILMS | 1992年 / 209卷 / 02期

关键词：

D O I：

10.1016/0040-6090(92)90668-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The microstructures of boron nitride films deposited on stainless steel substrates by an r.f. sputtering technique have been investigated by scanning and transmission electron microscopy and X-ray and electron diffraction. They were found to consist of a mixture of approximately 10 nm diameter grains of cubic structure and smaller, about 1 nm, crystallites of hexagonal structure. The distributions of crystallite sizes were determined directly from dark field electron micrographs. The nominal crystallite diameters derived from X-ray diffraction line broadening measurements were found to be in good agreement with the electron microscopy observations for the hexagonal but not for the cubic phase. This discrepancy is apparently due to the presence of fine twinning in the cubic grains.

引用

页码：155 / 160

页数：6

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