SURFACE-COMPOSITION AND DISTRIBUTION OF FLUORINE IN PLASMA-FLUORINATED POLYIMIDE

被引：32

作者：

MATIENZO, LJ ^{[1
]}

EMMI, F ^{[1
]}

EGITTO, FD ^{[1
]}

VANHART, DC ^{[1
]}

VUKANOVIC, V ^{[1
]}

TAKACS, GA ^{[1
]}

机构：

[1] ROCHESTER INST TECHNOL,DEPT CHEM,CTR MAT SCI & ENGN,ROCHESTER,NY 14623

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575037

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：950 / 953

页数：4

共 16 条

[1]

ANAND M, 1981, ACS SYM SER, V162, P353

[2] DESIGN CRITERIA FOR UNIFORM REACTION-RATES IN AN OXYGEN PLASMA [J].

BATTEY, JF .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1977, 24 (02) :140-146

[3] RELATION OF POLYMER STRUCTURE TO PLASMA-ETCHING BEHAVIOR - ROLE OF ATOMIC FLUORINE [J].

CAIN, SR ;

EGITTO, FD ;

EMMI, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1578-1584

[4]

DEDINAS J, 1984, 2ND INT C PLASM CHEM

[5]

DEDINAS J, 1983, 1ST P ANN INT C PLAS, P119

[6] ALGORITHMS FOR THE RAPID SIMULATION OF RUTHERFORD BACKSCATTERING SPECTRA [J].

DOOLITTLE, LR .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 9 (03) :344-351

[7] PLASMA-ETCHING OF ORGANIC MATERIALS .1. POLYIMIDE IN O2-CF4 [J].

EGITTO, FD ;

EMMI, F ;

HORWATH, RS ;

VUKANOVIC, V .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03) :893-904

[8] BASIC CHEMISTRY AND MECHANISMS OF PLASMA-ETCHING [J].

FLAMM, DL ;

DONNELLY, VM ;

IBBOTSON, DE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01) :23-30

[9] A KINETIC-STUDY OF THE PLASMA-ETCHING PROCESS .2. PROBE MEASUREMENTS OF ELECTRON PROPERTIES IN AN RF PLASMA-ETCHING REACTOR [J].

KUSHNER, MJ .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (04) :2939-2946

[10]

LEARY HJ, 1981, ACS SYM SER, V162, P419

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