KINETICS OF SLOW-TRAPPING INSTABILITY AT SI-SIO2 INTERFACE

被引：48

作者：

SINHA, AK

SMITH, TE

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 05期

关键词：

D O I：

10.1149/1.2131539

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：743 / 746

页数：4

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