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DESIGN AND PERFORMANCE OF MICRON-SIZE DEVICES
被引:34
作者
:
KLAASSEN, FM
论文数:
0
引用数:
0
h-index:
0
KLAASSEN, FM
机构
:
来源
:
SOLID-STATE ELECTRONICS
|
1978年
/ 21卷
/ 03期
关键词
:
D O I
:
10.1016/0038-1101(78)90028-X
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:565 / 571
页数:7
相关论文
共 19 条
[1]
ABBAS SA, 1975, IEDM35 TECHN DIG
[2]
DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS
DENNARD, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
DENNARD, RH
GAENSSLEN, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
GAENSSLEN, FH
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
YU, HN
RIDEOUT, VL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
RIDEOUT, VL
BASSOUS, E
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
BASSOUS, E
LEBLANC, AR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
LEBLANC, AR
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1974,
SC 9
(05)
: 256
-
268
[3]
ELMANSY YA, 1975, IEDM31 TECHN DIG
[4]
HIGH-PERFORMANCE MOS INTEGRATED-CIRCUIT USING ION-IMPLANTATION TECHNIQUE
FANG, FF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
FANG, FF
RUPPRECHT, HS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
RUPPRECHT, HS
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1975,
10
(04)
: 205
-
211
[5]
GRAAFF HCD, 1970, PHILIPS RES REP, V25, P21
[6]
INTEGRATED INJECTION LOGIC - NEW APPROACH TO LSI
HART, K
论文数:
0
引用数:
0
h-index:
0
HART, K
SLOB, A
论文数:
0
引用数:
0
h-index:
0
SLOB, A
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1972,
SC 7
(05)
: 346
-
&
[7]
LIMITATIONS IN MICROELECTRONICS .2. BIPOLAR TECHNOLOGY
HOENEISEN, B
论文数:
0
引用数:
0
h-index:
0
HOENEISEN, B
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(08)
: 891
-
+
[8]
FUNDAMENTAL LIMITATIONS IN MICROELECTRONICS .1. MOS TECHNOLOGY
HOENEISEN, B
论文数:
0
引用数:
0
h-index:
0
HOENEISEN, B
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(07)
: 819
-
+
[9]
HORI R, 1975, P C SOLID STATE DEVI, P193
[10]
PHYSICAL LIMITS IN DIGITAL ELECTRONICS
KEYES, RW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
KEYES, RW
[J].
PROCEEDINGS OF THE IEEE,
1975,
63
(05)
: 740
-
767
←
1
2
→
共 19 条
[1]
ABBAS SA, 1975, IEDM35 TECHN DIG
[2]
DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS
DENNARD, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
DENNARD, RH
GAENSSLEN, FH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
GAENSSLEN, FH
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
YU, HN
RIDEOUT, VL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
RIDEOUT, VL
BASSOUS, E
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
BASSOUS, E
LEBLANC, AR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, TJ WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
LEBLANC, AR
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1974,
SC 9
(05)
: 256
-
268
[3]
ELMANSY YA, 1975, IEDM31 TECHN DIG
[4]
HIGH-PERFORMANCE MOS INTEGRATED-CIRCUIT USING ION-IMPLANTATION TECHNIQUE
FANG, FF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
FANG, FF
RUPPRECHT, HS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
RUPPRECHT, HS
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1975,
10
(04)
: 205
-
211
[5]
GRAAFF HCD, 1970, PHILIPS RES REP, V25, P21
[6]
INTEGRATED INJECTION LOGIC - NEW APPROACH TO LSI
HART, K
论文数:
0
引用数:
0
h-index:
0
HART, K
SLOB, A
论文数:
0
引用数:
0
h-index:
0
SLOB, A
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1972,
SC 7
(05)
: 346
-
&
[7]
LIMITATIONS IN MICROELECTRONICS .2. BIPOLAR TECHNOLOGY
HOENEISEN, B
论文数:
0
引用数:
0
h-index:
0
HOENEISEN, B
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(08)
: 891
-
+
[8]
FUNDAMENTAL LIMITATIONS IN MICROELECTRONICS .1. MOS TECHNOLOGY
HOENEISEN, B
论文数:
0
引用数:
0
h-index:
0
HOENEISEN, B
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(07)
: 819
-
+
[9]
HORI R, 1975, P C SOLID STATE DEVI, P193
[10]
PHYSICAL LIMITS IN DIGITAL ELECTRONICS
KEYES, RW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
KEYES, RW
[J].
PROCEEDINGS OF THE IEEE,
1975,
63
(05)
: 740
-
767
←
1
2
→