THE PROPERTIES OF LPCVD SIO2 FILM DEPOSITED BY SIH2CL2 AND N2O MIXTURES

被引：30

作者：

WATANABE, K ^{[1
]}

TANIGAKI, T ^{[1
]}

WAKAYAMA, S ^{[1
]}

机构：

[1] SONY CORP,RES CTR,HODOGAYA,YOKOHAMA,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 12期

关键词：

D O I：

10.1149/1.2127317

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2630 / 2635

页数：6

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