EXPERIMENTAL-EVIDENCE FOR EXCITONIC MECHANISM OF DEFECT GENERATION IN HIGH-PURITY SILICA

被引:157
作者
TSAI, TE [1 ]
GRISCOM, DL [1 ]
机构
[1] USN,RES LAB,WASHINGTON,DC 20375
关键词
D O I
10.1103/PhysRevLett.67.2517
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Direct evidence for the creation of oxygen-vacancy, oxygen-interstitial pairs in SiO2 glasses by an excitonic mechanism is developed from an electron-spin-resonance study of high-purity fused silicas exposed to highly focused 6.4-eV excimer laser light.
引用
收藏
页码:2517 / 2520
页数:4
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